Just I've committed your patch to git head, thanks! Regards, mpsuzuki
r6144 wrote: > 在 2011-04-20三的 19:57 +0900，mpsuz...@hiroshima-u.ac.jp写道： >> On Wed, 20 Apr 2011 12:35:29 +0200 (CEST) >> Werner LEMBERG <w...@gnu.org> wrote: >>>> One of my anxiety was that the priority to the black/white evenness >>>> can reduce the contrast of the complex glyph. Please find attached >>>> picture comparing the results by HeiseiMaruGo-W4 at 16pt @ 72dpi. In >>>> my personal impression, the legibility of the strokes in enclosed >>>> area (like "日" or "目") is not important, but the legibility of the >>>> longest stroke should be respected. Please let me know how your >>>> opinion. >>> Thanks for reviewing. Do you have an idea how to increase the >>> legibility of the longest strokes? Contrary to the proposed patch I >>> think that this what you suggest is quite hard a job to achieve since >>> you not only have to do feature analysis, e.g., mark horizontal stems >>> which are surrounded by vertical stems like this >>> >>> |-----| >>> >>> as `unimportant', but also distort the glyph accordingly so that >>> `important' stems are aligned to the grid... >> I think what I requested (the longest stem should not be >> blurred) is difficult to co-exist with the proposed patch. >> So, if we find some comments that the rasterized result >> by 2.2.5 is too blurred and 2.2.4 is better, I will propose >> to revert the patch and discuss the appropriate condition >> to enable the feature. Fortunately, the proposed patch is >> not drastic. > > Yes, the long horizontal stroke at the middle of 量 often gets blurred > by the patch. It would be better if we align the longest strokes first > rather than doing it greedily, but after using this patch for two > months, I think the current result is good enough for now. Thank you > for reviewing the patch. > > r6144 > _______________________________________________ Freetype-devel mailing list Freetype-devel@nongnu.org https://lists.nongnu.org/mailman/listinfo/freetype-devel
