> "Expose with UV through negative film, develop with Sodium > Bicarbonate desolved in water, and strip with liquid drano desolved > in water." > > I am uninitiated in Negative film and usually use positive > MGChemicals boards. The way written, it is implied that the strip > step takes place bewteen develop and etch. Is this the case?
It reads to me "expose, develop, strip". Isn't that always the way with photoresist? _______________________________________________ geda-user mailing list geda-user@moria.seul.org http://www.seul.org/cgi-bin/mailman/listinfo/geda-user