commit: a97ee50d35b1680925f0c0363de84937d373e219 Author: Michał Górny <mgorny <AT> gentoo <DOT> org> AuthorDate: Wed Apr 3 08:53:23 2019 +0000 Commit: Michał Górny <mgorny <AT> gentoo <DOT> org> CommitDate: Wed Apr 3 09:31:47 2019 +0000 URL: https://gitweb.gentoo.org/repo/gentoo.git/commit/?id=a97ee50d
package.mask: Last rite dev-lang/polyml Signed-off-by: Michał Górny <mgorny <AT> gentoo.org> profiles/package.mask | 6 ++++++ 1 file changed, 6 insertions(+) diff --git a/profiles/package.mask b/profiles/package.mask index bf7bf32edcb..3031dfc4e2b 100644 --- a/profiles/package.mask +++ b/profiles/package.mask @@ -29,6 +29,12 @@ #--- END OF EXAMPLES --- +# Michał Górny <mgo...@gentoo.org> (03 Apr 2019) +# Does not build against libffi-3.3. Also other unsolved build failures +# (#619662, #606096). Needs version bump for almost 2 years. +# Removal in 30 days. Bug #667476. +dev-lang/polyml + # Michał Górny <mgo...@gentoo.org> (03 Apr 2019) # Depends on dev-lang/polyml that no longer builds. The current version # is two years old, and needs a bump for 1.5 year.