Hello Jatin,

I don't confess expertise but i think the absorption coeff. relates to the overlap between the initial and final wavefunction. Therefore the interference between outgoing and backscattering modulates the final wavefunction which manifests as the exafs fluctuations past the edge which in turn changes the It signal so we can use the difference between Io and It to measure exafs data. Any additional comments are welcomed if I am mistaken as I said I am not an expert.

Buena salud,

Chris Patridge


On Oct 8, 2010, at 9:30 AM, Jatinkumar Rana <[email protected] > wrote:

Hi Scott,

Nice to see you back-in-action from holidays. Thank you very much for your suggestions.

Since last few days i was trying to visualize the physical process going on inside an absorbing atom when we measure EXAFS, i met few really basic questions, which of course, could be due to lack of my understandings. Therefore, I tried to go through literatures and EXAFS books but i am not satisfied.

Therefore, i decided to put them to mailing list

My first question is :

In EXAFS, the oscillations are due to the intereference between the outgoing photo electron from absorbing atom and incoming backscattered photoelectron from the scatterer. Depending upon, how much they are out of phase w.r.t each other we get oscillations in EXAFS curve. These oscillations are nothing but the variation in the absobtion coefficient of sample as the energy of incident photon is varied.

I wonder, how, the intereference between the photo electrons is related to absorbtion coefficient of sample ??

because, It = I0 * exp (-ut)

My second question is :

While measuring EXAFS at beamline, we only measure the intial intensity (Io) and the transmitted intenstiy from sample (It). In other words, we only measure the number of photons before and after the sample and variation in abs.coeffi.(u) is related to variation in It.

How interference between photoelectrons will be reflected as variation in abs.coeffi. (u) of sample while we never measure photo electrons in EXAFS??

We only measure Io and It.

Also, whether the intereference between photo electrons is constructive or destructive, the incident photon will lose its energy once it knocks an electron from say K-shell of absorbing atom and hence photon is said to have absorbed.

I will be really thankful to you for your valuable explanation.

With Best regards,
Jatin Rana
HZB, Berlin





On 07.10.2010 19:00, [email protected] wrote:
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Today's Topics:

   1. Re: Multiple scattering paths in fitting (Frenkel, Anatoly)
2. Re: schemes for delr and sigma2 for multiple scattering paths
      (Scott Calvin)


--- -------------------------------------------------------------------

Message: 1
Date: Thu, 7 Oct 2010 09:38:26 -0400
From: "Frenkel, Anatoly"<[email protected]>
To: "XAFS Analysis using Ifeffit"<[email protected]>
Subject: Re: [Ifeffit] Multiple scattering paths in fitting
Message-ID:
   <[email protected]>
Content-Type: text/plain; charset="iso-8859-1"

For relationships between sigma2 for MS and SS paths, some are listed in the Appendix to this article:

P. Shanthakumar, et al, Physical Review B 74, 174103 (2006).

Anatoly



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Message: 2
Date: Thu, 7 Oct 2010 06:58:04 -0700
From: Scott Calvin<[email protected]>
To: XAFS Analysis using Ifeffit<[email protected]>
Subject: Re: [Ifeffit] schemes for delr and sigma2 for multiple
   scattering    paths
Message-ID:<[email protected]>
Content-Type: text/plain; charset=US-ASCII; format=flowed; delsp=yes

Jatin,

IF the uniform expansion model is valid for single scattering paths,
then it is for multiple scattering paths as well. For some materials,
particularly those with cubic space groups, that's got a good chance
of being a useful model. Others tends to distort with changes in
temperature, doping, etc., and it may not work as well. But even in
those cases, if you've decided how to constrain the delr for single-
scattering paths, you'll do reasonably well by using some kind of
appropriate average of the delr's for related single-scattering paths.

--Scott Calvin
Sarah Lawrence College

On Oct 7, 2010, at 3:05 AM, Jatinkumar Rana wrote:


Dear all,

It is reasonable to assign a constant fraction by which unit cell
expands at a given temperature of XAFS measuremnt and so the variation
in the path lengths for every single scattering paths could be
assigned
as delr = alpha * Reff. Similarly, one can assign  sigma2 value for
each
single scattering path depending on both type of scatterer and its
distance from the absorbing atom.

Now coming to multiple scattering paths, Sigma2 for multiple
scattering
paths can be constrained based on the sigma2 of related single
scattering paths and a definite path-geometry-dependent scheme
(Triangle, collinear, reversed etc.) could be applied.

Is there any such scheme for delr of multiple scattering paths ? or we
can simply assume that all paths (single scattering and multiple
scattering) undergo uniform expansion by a factor alpha.

Thank you so much in advance for your valuable time...

With best regards,
Jatin Rana
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