Apologies for crossposting. We are pleased to announce that registration for the Third International Provenance and Annotation Workshop (IPAW2010) is now available at https://www.cs.rpi.edu/ipaw2010/register.html. The registration site also includes information to help travel plans.
Please note that Early Registration ends May 24th and costs less than the fees for Late Registration and On-site Registration. Additionally, a Facebook group, IPAW2010, has been created, and we will be using the hash tag #ipaw2010 on Twitter. Regards, The IPAW 2010 team
