Some of the following is paraphrased from a commercial
site on "Plasma Cleaning" the RF process used for
cleaning semiconductor wafers, etc. via ion
excitation.
Some of it is based on 'inside information' from an
associate who has worked with these systems in the
semiconductor industry, and who can be almost as
optimistic as this writer about 'expanding the
horizon' at least when there are few 'red-flags' of
suspicion surrounding the claims ... (and consequently
cannot be really trusted ;-)
All of this is relevant to an "improved" Kanzius style
salt water burner, and also relevant to a merger of
several related concepts, including possibly LENR and
more likely the "real hydrino" (a short-lived
species).
The gist of the evolving concept is to move quickly
beyond the simple and naive approach (i.e. RF being
applied to salt water). Almost everyone with expertise
in RF engineering believes that the RF "coupling" in
the Kanzius concept can be improved *greatly* by
moving from a cold liquid medium to a mixed-gas-plasma
medium- steam, water mist, oxygen, probably argon and
entrained salt ions, and possibly even utilizing a
closed-cycle reactor. More on that later.
When a gas absorbs electrical energy, its temperature
increases causing the ions to vibrate and rotate.
Dense liquids tend to reflect applied RF. That is the
gist of the "coupling" problem that Kanzius has now.
In an inert gas, such as argon, the excited ions can
bombard a 'dirty' surface ("sandblast") and remove a
small amount of material. This is routinely done in
semiconductor manufacturing.
In the case of a reactive gas, such as oxygen or
chlorine, ionization leads to 'enhanced' chemical
reactions. For instance, the chemical reaction is
enhanced since the oxygen has been already converted
into ROS (reactive oxygen species).
As a result, organic compounds and residues volatilize
and are removed or burned. Kanzius has shown actual
water dissociation, and therefore this finding creates
the situation where true closed-cycle combustion
becomes a distinct possibility IF (and only if) there
is gainfulness in the thermodynamics, due to hydrinos
or LENR of "supra-chemical" (ballotechnic) reactions.
More on that later.
Radio frequency (RF), microwaves, and alternating or
direct current or radioactive decay can all energize
gases and plasmas. There could be synergy in using
various combinations these inputs.
Energetic species in gas plasma include ions,
electrons, radicals, metastable chemical
intermediates, and photons in visible and ultraviolet
(UV) range. All of these operate in the geometry where
the Casimir force is seen. Chlorine has extraordinary
photochemical excitability, and therein lies a
possible route to synergy. All of these variables are
why the news story from last year generated so much
broad enthusiasm, even though no claim for OU has been
made (officially).
If there is really such a beast in fissix as the
"supra-chemical" reaction, then chlorine is the
easiest place to find it. This would be a non-nuclear
reaction where the "excess" energy comes from inner
electron orbitals (Mössbauer-like) and ultimately from
Casimir-ZPE (in the sense of the Dirac epo lattice).
Caveat: There is evidence for supra-chemical and
ballotechnic reactions in the literature, but it is
not at all convincing to most experts. It is also
related to the alternative explanations for the excess
energy seen by Mills- that being a transitory species
of protium which shrinks, BUT then taps into
Casimir-ZPE to immediately revert, unlike the Mills
conception of stability.
History of Using 13.56 MHz
In the 1940s, coroners (pre CSI!) used diffusion
tubes, also known as "ashers," as forensics tools.
Samples from a deceased body would be placed inside a
quartz diffusion tube and brought to temperatures
exceeding 1000 °C. A spectrometer would provide a
rough chemical analysis to determine whether poisoning
had occurred. However, early diffusion tubes had too
slow of a rise-time in temperature- thus the need to
add an RF component which couples well to a gas
stream.
Since the allowable frequency standard (from the FCC)
for RF equipment is/was in the range of 1314 MHz,
this became the target range for RF amps - purely by
default. Early on, an inventor named Royal Rife
pioneered RF for medical uses (controversial). Kanzius
and Roy most definitely should have credited Rife with
the basic idea (for Cancer treatment) and they should
be faulted for this oversight, as well as lack of
attribution to many others in their patent claims.
http://en.wikipedia.org/wiki/Royal_Rife
For decades, RF ashers and assorted thermal units were
sold to the medical and forensic industry, but the
demand remained small. Then came "chips" and RFID and
the demand has skyrocketed for RF amplifiers in this
range.
Semiconductor Industry
In the 1960s, process engineers became interested in
ashers. They needed an alternative way to remove the
photoresist from wafers. Until then, they'd been using
a dangerous mix of sulfuric acid and hydrogen peroxide
(known as "piranha"). For this reason, RF ashers were
readily adopted for use in semiconductor fabrication.
The tool, sometimes called a barrel resist stripper,
inherited the legacy frequency standard for medical
equipment established in the 1940s.
However, there was NO underlying physical reason, or
natural resonance to prefer 13.56 MHz to 12 MHz to
14.5 MHz (or even a lower kilo-Hertz range of
frequency).
As research on plasma energy became more advanced, the
optimum frequency was found to be more a function of
plasma chamber design and the shape of the object to
be cleaned. Today's commercial plasma equipment may
run DC, 40 kHz, 13.54 MHz, or 2.54 GHz.
As a rule of thumb:
* DC to below 100 Hz is used for sputtering
plasma, with electron guns providing the plasma energy
* 30 to 100 kHz is used for capacitive plasma
generators, typically used for flat pieces
* 10 to 100 MHz is used for inductive plasma
generators where a circular or tube is needed with the
plasma being generated at the outside of the tube
* 2.54 GHz and above is microwave range and used
for small chambers with power beamed in, typically
single wafer resist strippers.
Bottom Line of this recent history of RF medical and
plasma stripping - wrt to future "hydrogen-on-demand"
(alternative energy):
There is a highly trained cadre of RF specialists in
silicon valley, and a large amount of good used
equipment in various ranges, not confined to 13.56
Mhz. Nowadays with layoffs in chips, and with the VC
(venture capital) industry actively seeking-out
energy-related ideas and Tech, this niche area
(hydrogen-on-demand) is primed to take-off. If there
is a real anomaly there - it will not be long before
it is documented.
Although the Kanzius/ Roy process has US Patent apps
in progress, insiders say that the most relevant prior
art was already in-place long ago - and that that the
field is essentially open for innovation- in exactly
the same tradition which spawned silicon valley to
begin with.
Look for major advances soon. This is not going away.
If there is anything which is ultimately "gainful"
from RF stimulation of water/steam/mist, then it could
be found and documented "any day now" .... (is there
an echo in here?)
Jones
