On Tue, May 26, 2015 at 01:55:09PM -0700, Keith Packard wrote: > Change the definition of composite glyphs from using an explicit > dst-x/dst-y location to match current implementation which uses the > dx/dy values from the first glyphitem for the destination location. > > Define the source pattern origin to align with that first glyph > location. > > Eliminate use of the mask-format in composite glyphs to clean up > rendering.
Pardon? You are changing the expected rendering from being a union of the glyphs to rendering individual glyphs. That's a big change for the users who expect a union of the glyph path when specifying a mask - plus the effect the mask has for allowing combining a mixture of glyph formats without unwanted fringing. -Chris -- Chris Wilson, Intel Open Source Technology Centre _______________________________________________ xorg-devel@lists.x.org: X.Org development Archives: http://lists.x.org/archives/xorg-devel Info: http://lists.x.org/mailman/listinfo/xorg-devel
