Dear Petmc, Many years ago I was associated with a large (and innovative) research and development firm.....we conducted extensive design and operational tests of varying untrasonic designs----principally for cleaning objectives. One of the most distinctive effects of using ultrasound for these activities was that was a non-discriminatory cleaner. That is, high energies at these frequencies (we used 38 KC most frequently) will dislodge microscopic particulates that a majority of other means----sometimes including chemical reactions----had failed to accomplish. This being the case I would caution all experimenters to keep this characteristic in mind-----and to ALWAYS subject the intended containment vessel to an ultrasonic cleaning itself (using distilled water to the highest solution level anticipated for generating the CS product). This procedure should last from 3 to 5 minutes. This is the most convenient and reliable method for preparing your generation vessel for an acceptably-clean condition for producing CS in such an environment (at least, this is my opinion). One other consideration worthy of possible reflection........ultrasonic energy's indiscriminate action insures that any compounds and/or impurities resulting from the generation process itself----will be subject to disassociation, size-reduction and distribution throughout the liquid medium being used to produce the CS........and this, obviously, includes any materials adhering to the container walls. Sincerely, Brooks Bradley.
brpete...@msn.com.au wrote: > As a user of the pulsed d.c. method of cs generation,I have recently become > curious as to any beneficial effect of ultrasound frequencies applied to the > colloidal process. > > > -- > The silver-list is a moderated forum for discussion of colloidal silver. > > Instructions for unsubscribing may be found at: http://silverlist.org > > To post, address your message to: silver-list@eskimo.com > > Silver-list archive: http://escribe.com/health/thesilverlist/index.html > > List maintainer: Mike Devour <mdev...@eskimo.com>