Hi Jon, Riston sounds like better stuff and easier to use. I think one gets sharper etching if the etchant is pumped over the foil.
I guess I'm pretty casual about solvents having worked with benzene above the permissible limit for several weeks each year. Anytime you can smell benzene you are above the 8 hour limit. We used benzene for an extractant in the analysis of alpha and beta acids in hops (the bittering component). After years of using benzene the procedure changed to toluene which is about 10 times less toxic. If these and other chemicals were as dangerous as some people think I would have been dead long ago. I think I'm still here. ;-) Dave On Dec 25, 2007, at 9:22 PM, Jon Elson wrote: > Kirk Wallace wrote: >> KPR? >> >> Kentucky Paranormal Research >> Kawartha Pine Ridge District Public School Board > Kodak Photo Resist, a Xylene-based organic photo resist that is > hardened by exposure to UV light. It is very "old school" and > not only requires nasty chemicals, but is quite fragile. The > aqueous-based developer for Riston photo resist is washing soda, > and the stripper is a weak lye solution, I get both on my hands > without harm. > > Jon > > ---------------------------------------------------------------------- > --- > This SF.net email is sponsored by: Microsoft > Defy all challenges. Microsoft(R) Visual Studio 2005. > http://clk.atdmt.com/MRT/go/vse0120000070mrt/direct/01/ > _______________________________________________ > Emc-users mailing list > Emc-users@lists.sourceforge.net > https://lists.sourceforge.net/lists/listinfo/emc-users ------------------------------------------------------------------------- This SF.net email is sponsored by: Microsoft Defy all challenges. Microsoft(R) Visual Studio 2005. http://clk.atdmt.com/MRT/go/vse0120000070mrt/direct/01/ _______________________________________________ Emc-users mailing list Emc-users@lists.sourceforge.net https://lists.sourceforge.net/lists/listinfo/emc-users
